Scope
EUROSOI Workshop is an international forum to promote interaction and exchanges between research groups and industrial partners involved in SOI activities all over the world. Following the lively experience of the previous meetings in Granada (2005), Grenoble (2006), Leuven (2007), Cork (2008), Göteborg (2009) and Grenoble (2010), EUROSOI 2011 will be held in Granada and will include oral and poster sessions, outstanding key-note presentations, a tutorial, a social program as well as ample room for informal discussions. EUROSOI covers recent progress in SOI technologies and will be of interest to materials and device scientists, as well as to process, circuits and applications oriented engineers.
Original theoretical and experimental contributions are solicited. Typical topics include:
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(1) Synthesis of advanced SOI wafers (Ge, SiGe and strained layers, SOI heterostructures)
(2) Materials evaluation, properties of ultra-thin films and buried oxides, defects and stress, interface quality
(3) SOI MOSFETs: characterization, modeling and simulation of typical mechanisms, parameter extraction, reliability issues
(4) Circuit design, process and applications: low power/voltage and RF circuits, innovative memories, high voltage devices, imagers, sensors, photovoltaics and MEMS
(5) More than Moore perspectives: multiple-gates, 3D stacks of devices and circuits, nanowires, NEMS, tunneling transistors, heterogeneous integration etc.